Interferometric topological metrology with pre-established reference scale

ABSTRACT

A method is described that involves measuring a first set of interferometer fringe line disturbances against pre-determined measurement scale information in order to generate a first set of profiles that describe the topography of a sample that is placed upon a sample stage associated with the interferometer. The first set of profiles map to traces that run over a first axis of the sample and the sample stage. The traces have a recognized spacing between one another along a second axis of the sample and the sample stage. The method also involves adjusting the relative position of the traces to the sample so as to create a second set of fringe line disturbances. The method also involves measuring, the second set of interferometer fringe line disturbances against the pre-determined measurement scale information in order to generate a second set of profiles that describe the topography of the sample. The method also involves interleaving the first set of profiles and the second set of profiles to create a topography description of the sample that has a resolution along the second axis that is smaller than the spacing.

FIELD OF INVENTION

[0001] The field of invention relates generally to measurementtechniques; and, more specifically, to a pre-established reference scalefor an interferometric topological measurement.

BACKGROUND

[0002] 1.0 Basic Interferometry

[0003] Interferometry involves the analysis of interfering waves inorder to measure a distance. Interferometers, which are measurementtools that perform interferometry, typically reflect a first series ofoptical waves from a first reflecting surface; and, reflect a secondseries of optical waves from a second reflecting surface. The first andsecond series of waves are subsequently combined to form a combinedwaveform. A signal produced through the detection of the combinedwaveform is then processed to understand the relative positioning of thereflective surfaces. FIG. 1 shows an embodiment of a type ofinterferometer that is often referred to as a Michelson interferometer.

[0004] Referring to FIG. 1, a light source 101 and splitter 102 are usedto form a first group of light waves that are directed to a referencemirror 104; and, a second group of light waves that are directed to aplane mirror 103. The splitter 102 effectively divides the light 106from the light source 101 in order to form these groups of light waves.Typically, the splitter 102 is designed to split the light 106 from thelight source 101 evenly so that 50% of the optical intensity from thelight source 101 is directed to the reference mirror 104 and 50% of theoptical intensity from the light source 101 is directed to the planemirror 103.

[0005] At least a portion of the light that is directed to the planemirror 103 reflects back to the splitter 102 (by traveling in the +zdirection after reflection); and, at least a portion of the light thatis directed to the reference mirror 104 reflects back to the splitter102 (by traveling in the −y direction after reflection). The reflectedlight from the reference mirror 104 and plane mirror 103 are effectivelycombined by the splitter 102 to form a third group of light waves thatpropagate in the −y direction and impinge upon a detector 105. Theoptical intensity pattern(s) observed by the detector 105 are thenanalyzed in order to measure the difference between the distances d1, d2that exist between the plane mirror 103 and the reference mirror 104,respectively.

[0006] That is, for planar wavefronts, if distance d₂ is known, distanced₁ can be measured by measuring the intensity of the light received atthe detector 105. Here, according to wave interference principles, ifdistance d₁ is equal to distance d₂; then, the reflected waveforms willconstructively interfere with one another when combined by the splitter102 (so that their amplitudes are added together). Likewise, if thedifference between distance d, and distance d₂ is one half thewavelength of the light emitted by light source 101; then, the reflectedwaveforms will destructively interfere with one another when combined bythe splitter 102 (so that their amplitudes are subtracted from oneanother).

[0007] The former situation (constructive interference) produces arelative maximum optical intensity (i.e., a relative “brightest” light)at the detector 105; and, the later situation (destructive interference)produces a relative minimum optical intensity (i.e., a relative“darkest” light). When the difference between distance d1 and distanced2 is somewhere between zero and one half the wavelength of the lightemitted by the light source 101, the intensity of the light that isobserved by the detector 105 is less than the relative brightest lightfrom constructive interference but greater than the relative darkestlight from destructive interference (e.g., a shade of “gray” between therelative “brightest” and “darkest” light intensities). The precise“shade of gray” observed by the detector 105 is a function of thedifference between distance d₁ and distance d₂.

[0008] In particular, the light observed by the detector 105 becomesdarker as the difference between distance d₁ and distance d₂ depart fromzero and approach one half the wavelength of the light emitted by thelight source 101. Thus, the difference between d1 and d2 can beaccurately measured by analyzing the optical intensity observed by thedetector 105. For planar optical wavefronts, the optical intensityshould be “constant” over the surface of the detector 105 because(according to a simplistic perspective) whatever the difference betweendistance d₁ and d₂ (even if zero), an identical “effect” will apply toeach optical path length experienced by any pair of reflected rays thatare combined by the splitter 102 to form an optical ray that is directedto the detector 105.

[0009] Here, note that the 45° orientation of the splitter 102 causesthe reference mirror directed and plane mirror directed portions oflight to travel equal distances within the splitter 102. For example,analysis of FIG. 1 will reveal that the reference mirror and planemirror directed portions of ray 107 travel equal distances withinsplitter 102; and, that the reference mirror and plane mirror directedportions of ray 108 travel equal distances within splitter 102. As alllight rays traveling to detector 105 from splitter 102 must travel thesame distance d3, it is clear then that the only difference in opticalpath length as between the plane mirror and reference mirror directedportions of light (that are combined to form a common ray that impingesupon the detector 105), must arise from a difference between d1 and d2;and; likewise, for planar wavefronts, a difference between d1 and d2should affect all light rays impingent upon detector 105 equally. Assuch, ideally, the same “shade of gray” should be observed across theentirety of the detector; and, the particular “shade of gray” can beused to determine the difference between distance d1 and d2 from waveinterference principles.

[0010] 2.0 Interferometer Having A “Tilted” Reference Mirror

[0011] Referring to FIG. 2, when the reference mirror 204 is tilted(e.g., such that θ is greater than 0° as observed in FIG. 2), theoptical intensity observed at the detector 205 departs from beinguniform across the surface of the detector 205 because the differencesin optical path length as between plane mirror 203 and reference mirror204 directed portions of light are no longer uniform. Better said, the“tilt” in the reference mirror 204 causes variation in optical pathlength amongst the light waves that are directed to the reference mirror204; which, in turn, causes variation in the optical intensity observedat the detector 205.

[0012] Here, as wave interference principles will still apply at thedetector 205, the variation in optical path length that is introduced bythe tilted reference mirror 204 can be viewed as causing optical pathlength differences experienced by light that impinges upon the detector202 to effectively progress through distances of λ/2, λ, 3λ/2, 2λ, 5λ/2,3λ, etc. (where λ is the wavelength of the light source). This, in turn,corresponds to continuous back and forth transitioning betweenconstructive interference and destructive interference along the z axisof the detector 205. FIG. 3a shows an example of the optical intensitypattern 350 observed at the detector 305 when the reference mirror of aninterferometer is tilted (as observed in FIG. 2).

[0013] Here, notice that the optical intensity pattern 350 includesrelative minima 352 a, 352 b, and 352 c; and, relative maxima 351 a, 351b, 351 c, and 351 d. The relative minima 352 a, 352 b, and 352 c, whichshould appear as a “darkest” hue within their region of the detector305, are referred to as “fringe lines”. FIG. 3b shows a depiction of thefringe lines that appear on a detector when the reference mirror of aninterferometer is tilted. Here, ideally, fringe lines that run along thex axis will repeatedly appear as one moves across the z axis of thedetector. The separation of the fringe lines is a function of both thewavelength of the light source and the angle at which the referencemirror is tilted. More specifically, the separation of the fringe linesis proportional to the wavelength of the light source and inverselyproportional to the angle of the tilt. Hence, fringe line separation maybe expressed as ˜λ/θ.

FIGURES

[0014] The present invention is illustrated by way of example and notlimitation in the figures of the accompanying drawings.

[0015]FIG. 1 shows an interferometric measurement system;

[0016]FIG. 2 shows an interferometric measurement system having a tiltedreference mirror;

[0017]FIG. 3a shows a depiction of an optical intensity pattern thatresults when the reference mirror of an interferometric is tilted;

[0018]FIG. 3b shows the fringe lines observed at the detector of aninterferometer when its reference mirror is tilted;

[0019]FIG. 4a shows how a fringe line maps to a particular y axislocation along the sample stage;

[0020]FIG. 4b shows perturbations inflicted upon the fringe lines of aninterferometer having a tilted reference mirror as a result of a samplebeing placed upon the inteferometer's sample stage;

[0021]FIG. 5 shows an embodiment of a methodology that may be used togenerate a topographical description of a sample;

[0022]FIG. 6 shows an embodiment of a methodology for establishing areference scale against which fringe line changes are to measured;

[0023]FIG. 7a shows a “top view” of a reference standard;

[0024]FIG. 7b shows a slanted view of the reference standard of FIG. 7a;

[0025]FIG. 7c shows a representation of the image that appears at thedetector of an interferometer having a tilted reference mirror when areference standard is placed on the sample stage;

[0026]FIG. 8 shows an embodiment of a methodology for aligning fringelines to the reference lines of a reference standard that is placed onthe sample stage of an interferometer;

[0027]FIG. 9a shows neighboring fringe lines on a CCD array detector foran interferometer having a tilted reference mirror;

[0028]FIG. 9b shows the disturbance caused to one of the fringe lineswhen a sample having a height of λ/4 is placed along its optical path;

[0029]FIG. 10a shows an embodiment of an interferometer having a tiltedreference mirror that measures sample topography against apre-established measurement scale;

[0030]FIG. 10b shows an embodiment of a computing system;

[0031]FIG. 11a shows a methodology for detecting fringes;

[0032]FIG. 11b shows a circuit that may be used to detect fringe lines;

[0033]FIG. 11c shows signals that are relevant to the operation of thecircuit of FIG. 11b;

[0034]FIG. 12a shows an embodiment of fringe tracings that are used toform a pre-established measurement scale;

[0035]FIG. 12b shows a perspective of a pre-established measurementscale;

[0036]FIG. 13 shows an embodiment of the disturbances that are caused tothe fringe tracings of FIG. 12a when a sample is introduced to aninterferometer;

[0037]FIG. 14 shows topography information of the sample that isextracted from an analysis of the fringe tracings of FIGS. 12a and 13;

[0038]FIG. 15 shows an embodiment of a circuit that may be used toimplement the topography measurement unit of FIG. 10A;

[0039]FIG. 16a shows a depiction of a “new” pattern of fringe tracingsafter a sample is moved along the y axis;

[0040]FIG. 16b shows a depiction of the “new” relative positioning ofthe sample that corresponds to the “new” fringe pattern tracingsobserved in FIG. 18a;

[0041]FIG. 17 shows a depiction of a topography description of a samplederived from the fringe tracings observed in FIGS. 13 and 18a;

[0042]FIG. 18a shows an exemplary depiction of a reflectivity vs.lightsource wavelength suitable for characterizing sample composition;

[0043]FIG. 18b shows a first methodology that may be used to generate areflectivity vs. lightsource curve;

[0044]FIG. 18c shows a second methodology that may be used to generate areflectivity vs. lightsource curve;

[0045]FIG. 19a shows an exemplary depiction of fringe line disturbancesthat expand outside their associated reference field;

[0046]FIG. 19b shows an exemplary depiction of a sample that could causethe fringe line disturbance patterns observed in FIG. 19a;

[0047]FIG. 20 shows a methodology that may be used to follow a fringeline that is disturbed beyond its associated reference field;

[0048]FIG. 21a shows a methodology that may be used to follow aparticular edge of a fringe line disturbance that is disturbed beyondits associated reference field;

[0049]FIG. 21b is an exemplary depiction that applies to the followingof a segment of the downward sloped edge of fringe line 1951 b of FIG.19;

[0050]FIG. 21c is an exemplary depiction that applies to the followingof a segment of the upward sloped edge of fringe line 1951 b of FIG. 19.

DETAILED DESCRIPTION

[0051] As described below, principles of interferometry are utilized sothat an accurate description of the surface topology of a sample can begained. More specifically, fringe line disturbances observed on thedetector of an interferometer (that are caused by the introduction ofthe sample to the interferometer) are measured against a pre-establishedreference scale. As a result, the height of the sample can be mapped tospecific locations on the surface of the sample; which, in turn, allowsfor the development of a precise description of the topographicalnuances of the sample.

[0052] 1.0 Mapping of Detector Surface Location to Sample Stage SurfaceTrace

[0053]FIGS. 4a and 4 b together show an embodiment of the “mapping” thatexists between the fringe lines that appear on the detector 405 of aninterferometer having a tilted reference mirror; and, the corresponding“traces” of these fringe line on a sample stage 403. Here, the samplestage 403 may have a reflective coating so that, by itself, it behavesthe same as (or at least similar to) the plane mirror 103 discussedabove in the background section. Referring to FIG. 4a, for a 45°splitter 402 orientation, each fringe line effectively “maps to” a tracethat runs parallel to the x axis at a specific y axis location on thesample stage 403. That is, each fringe line “maps to” its 90° reflectionoff of the splitter 402 and toward the sample stage 403. Here, if the zaxis positioning of a fringe line on the detector (e.g., z axis positionz_(k)) is projected to the splitter 402 (via projection 491) and“reflected” off of the splitter 402 at an angle of 90′ (to formprojection 492) to the sample stage 403, the projection 492 to thesample stage 403 will impinge upon a particular y axis location of thesample stage 403 (e.g., Yk as observed in FIG. 4a).

[0054] Referring to FIG. 4b, when a sample whose topography is to bemeasured (e.g., sample 460) is placed upon the sample stage 403,disturbances to the fringe lines (as compared to their originalappearance prior to the appearance of the sample) will appear. For eachfringe line, the disturbance(s) follow the topography of the sample 460along its “mapped to” trace that runs parallel to the x axis along thesample stage 403 as described in FIG. 4a. Thus, referring to FIG. 4b,the disturbance of fringe lines 451 b, 451 c, 451 d on the detector 405“map to” traces 452 b, 452 c, 452 d, respectively on the sample stage403. Since the sample 460 does not cover traces 452 a, 452 e of thesample stage 403, fringe lines 451 a and 451 e remain undisturbed uponthe detector 403.

[0055] 2.0 Interferometry Measurement Technique Employing aPre-Established Measurement Scale

[0056]FIG. 5 shows an embodiment of a methodology for developing adescription of the topography of a sample by measuring optical fringeline disturbances (that occur in response to a sample being placed uponthe sample stage of an interferometer) against a pre-establishedmeasurement scale. According to the approach of FIG. 5, a measurementscale (which may also be referred to as a reference scale, scale, etc.)is first established 501. The measurement scale can be viewed as akin toa ruler that is used to measure fringe line disturbances. As such, whena sample is introduced to the interferometer and an interferometricimage of the sample is produced 502, the topography of the sample can beprecisely understood by way of measuring the fringe lines against thepre-established measurement scale 503.

[0057] Better said, the disturbances experienced by the fringe lines inresponse to the sample being introduced to the interferometer can beprecisely translated into sample height along known locations in the xyplane of the sample stage. The pre-establishment of a reference scalenot only allows for highly precise surface topography descriptions butalso allows for efficiently produced surface topography descriptions(e.g., in terms of equipment sophistication and/or time expended). FIGS.6 through 9a, 9 b relate to the establishment of a measurement scale;and, a discussion of each of these Figures follows immediately followsbelow.

[0058] 3.0 Establishment of Measurement Scale

[0059]FIG. 6 shows a methodology for establishing a measurement scale.Note that the methodology of FIG. 6 includes an “accuracy in the xyplane” component 610; and, an “accuracy in the z direction” component611. Here, referring to FIGS. 4b and 6, setting the accuracy in the xyplane 610 corresponds to producing a measurement scale from whichprecise positions along the plane of the sample stage 403 can bededuced. Likewise, setting the accuracy in the z direction 611corresponds to producing a measurement scale from which precise changesin the topographical profile of the sample 460 can be tracked. Bycombination of establishing accuracy in the xy plane as well as in the zdirection, a three dimensional description of the sample can begenerated that precisely tracks sample height (in the z direction)across a plurality of x and y positions over the surface of the sample460 and the sample stage 403.

[0060] According to the methodology of FIG. 6, accuracy in the xy planecan be established by aligning 610 the fringe lines that are observed onthe detector 405 to be equidistant with those of a calibration standard(noting that, with respect to FIG. 4b, the calibration standard ispresented upon the stage 403 rather than a sample 460). Once the fringelines are aligned 610, a “per pixel unit of sample height measurement”parameter is calculated 611.

[0061] Here, an array of optically sensitive devices (e.g., an array ofcharge coupled devices (CCDs)) may be used to implement the detector405. Each array location may be referred to as a “pixel”. Because of thearray, each optically sensitive device that a disturbed fringe linefeature runs across will correspond to a unique x,y,z position (abovethe surface plane of the detector 405) along the topography of thesample. Better said, the setting of the accuracy in the xy plane 610allows a detector pixel to be “mapped” to a specific position in the xyplane of the sample stage. As such, should a fringe line becomedisturbed upon introduction of a sample to the interferometer, thedistance(s) that the fringe line moves upon the detector from itsoriginal, undisturbed pixel locations will correspond to the height ofthe sample at those particular x,y sample stage positions that theoriginal, undisturbed pixel locations mapped to.

[0062] Thus, as each of the optically sensitive devices that make up thearray consume a quantifiable amount of surface area on the plane of thedetector 405 (i.e., each pixel has a “size”), when measuring the expanseof a fringe line disturbance, each pixel will typically correspond to aparticular unit of “height” above the sample stage as measured along thez axis of the detector. Better said, recalling from the discussion ofFIG. 4b that fringe line disturbances result from the placement of asample 460 on the interferometer sample stage 403, a specific change infringe line position can be translated to a specific sample height.

[0063] Here, the height of the sample can be deduced from the distancealong the z axis that a fringe line section or portion will “move” alongthe surface of the detector 405 (i.e., be disturbed) by the introductionof the sample 460 to the interferometer. As such, each pixel positioncan be correlated to a specific unit distance along the z axis above thesurface of the sample stage 403; which, in turn, can be used to “figureout” the height of the sample above the sample stage 403. Morediscussion of this topic is provided further below with respect to FIGS.9a and 9 b.

[0064] For purpose of explaining FIG. 6, however, the amount of unitdistance along the z axis above the sample stage 403 that a pixelrepresents can be referred to as the “per pixel unit of sample heightmeasurement” 611. For example, if the per pixel unit of sample heightmeasurement is 20 nm; and, a fringe line is observed to move 3 pixelsalong the z axis of the detector 405 when a sample is placed upon thesample stage; then, the sample height will be calculated as 60 nm. As aside note, each pixel's optically sensitive device may be configured sothat the optical intensity that impinges upon its unique xz position ofthe detector 405 is provided as a digital output. For example, eachoptically sensitive device in the array may be configured to provide abyte of information that represents the optical intensity observed atits particular, unique xz location on the detector 405 surface.

[0065] Once the fringe lines have been aligned 610 to a calibrationstandard and the per pixel unit of sample height measurement iscalculated 611, a pre-established measurement scale can be formed byrecording 612: 1) information related to the mapping of the detector'sfringe lines to the sample stage 403 without a sample being placed onthe sample stage (e.g, for each fringe line observed on the detector 405when a sample is not placed upon the sample stage: a) recording its x,zpixel locations on the detector 405; and b) recognizing how the x,zlocations on the detector 405 map to x,y locations upon the sample stage403); and, 2) the per pixel unit of sample height measurement.

[0066] Note that a sample is the “thing” whose surface topography is tobe measured. According to the methodology of FIG. 6 then, once theundisturbed fringe lines have been aligned and their mapping positionrecorded; and, once, the per pixel unit of sample height measurement iscalculated and recorded, information has been stored 612 that issuitable for creating a measurement scale that can be used to measurethe topography of a sample.

[0067] 3.1 Aligning Fringe Lines with a Calibration Standard

[0068]FIGS. 7a through 7 c and FIG. 8 relate to a technique for aligning610 the fringe lines to a calibration standard as discussed in FIG. 6. Acalibration standard is a device having markings that are spaced apartwith a high degree of precision. For example, the National Institute ofStandards and Technology (NIST) provide calibration standards havinglengthwise gratings that are spaced evenly apart (e.g., where eachgrating is spaced 1 μm apart). An example of a calibration standard isobserved in FIGS. 7a and 7 b. Here, each grating (or other marking) isspaced evenly apart by a distance of “Y” on the surface of thecalibration standard. FIG. 7a shows a “top down” view of an exemplarycalibration standard 700 while FIG. 7b shows a slanted view of anexemplary calibration standard 700.

[0069]FIG. 7c shows a representation 701 of the optical image thatappears on the detector of an interferometer having a tilted referencemirror when the calibration standard is placed on its sample stage.Here, the optical image will include images of the markings of thecalibration standard and the fringe lines that result from the referencemirror of the interferometer being tilted. In the depiction of FIG. 7c,for illustrative simplicity, the calibration markings and fringe linesare shown according to a “split-screen” depiction. That is, theappearance of the calibration standard markings 710 a through 710 f areshown on the left hand side 702 of the optical image representation 701;and, the appearance of the fringe lines 711 a through 711 e are shown onthe right hand side 703 of the optical image representation.

[0070] Note that, in the exemplary depiction of FIG. 7c, the calibrationstandard should be placed upon the sample stage such that thecalibration markings run along the x axis. FIG. 8 shows a technique foraligning the fringe lines 711 a through 711 e to the calibrationmarkings 710 a through 710 e within the optical image that wasrepresented in FIG. 7c. According to the methodology of FIG. 8, andreferring to FIGS. 4b and 8 (noting that one should envision the sample460 of FIG. 4b as being replaced by a calibration standard), the tiltangle of the reference mirror 404 is adjusted to set the spacing offringe lines 810 a through 810 e equidistant with the spacing of thecalibration markings 811 a through 811 e as observed in depiction 801 a.Here, recall from the discussion of FIG. 3 that the separation of thefringe lines are inversely proportional to the tilt angle θ of thereference mirror.

[0071] As fringe spacing is a function of the tilt angle θ, the fringeline spacing can be made to be equidistant with the calibration markingspacings by adjusting 820 the tilt angle θ as appropriate. Depiction 801a shows an embodiment where neighboring fringe line spacings are madeequidistant with neighboring calibration marking spacings. As such,neighboring calibration markings 810 a through 810 e having the samespacing (“Y”) as neighboring fringe lines 811 a through 811 e. In otherembodiments (e.g., where the density of fringe lines is greater than thedensity of calibration markings), a fixed number of fringe lines may beset per calibration marking. For example, as just one embodiment, 10fringe lines may be established per calibration marking allowing for afringe line density that is 10 times that of the calibration markingdensity of the calibration standard.

[0072] Note, however, that even though the depiction 801 a of FIG. 8shows the fringe line spacings being equidistant with the calibrationmarking spacings, the fringe lines themselves 811 a through 811 e arenot aligned with the calibration markings 810 a through 810 e. Here, theposition of the reference mirror 404 along the y axis may be adjusted821. That is, fringe lines can be made to move up or down along the zaxis of the detector by adjusting the y axis position of the referencemirror 404; and, according to the approach of FIG. 8, the y axislocation of the reference mirror 404 may be adjusted so that, asobserved in depiction 801 b, the fringe lines 811 a through 811 e “lineup with” the calibration markings 810 a through 810 e. Note that thefringe lines 811 a through 811 e are shown to be spaced apart a distanceof Y in depiction 801 b. This, again, traces back to the spacing of Ybetween neighboring markings of the calibration standard as originallyshown in FIG. 7c. Note that the second process 821 is optional as thesetting of the fringe line spacings from process 820 establishesmeasurement accuracy in the xy plane of the sample stage.

[0073] Here, in conjunction with the mapping of the fringe lines totraces that run along the x axis of the sample stage 403 at specific yaxis locations (as discussed in detail previously with respect to FIG.4a), the alignment of the fringe lines to a calibration standard that isplaced upon the sample stage 403 allows the relative spacing between thefringe lines to be precisely and accurately correlated to a specificdistance along the y axis of the sample stage 403. Thus, if a 1:1 fringeline to calibration marking ratio is established (and the calibrationmarkings are known to be spaced a distance of Y apart), the fringe linescan be used to measure surface changes of a sample as they occurprecisely Y apart along the y axis of the sample stage. Similarly, asanother example, if a 10:1 fringe line to calibration marking ratio isestablished (and the calibration markings are known to be spaced adistance of Y apart), the fringe lines can be used to measure surfacechanges of a sample as they occur precisely 0.1Y apart along the y axisof the sample stage.

[0074] In an embodiment, the understood distance between neighboringfringe lines as they map to the xy plane of the sample stage isnormalized by the number of pixels between neighboring fringe lines asobserved on the detector. This calculation effectively corresponds to adistance along the y axis of the sample stage (and along the x axis ofthe sample stage) that each pixel corresponds to (i.e., a distance “perpixel” along both the x axis and the y axis of the detector that eachpixel represents).

[0075] For example, if 10 pixels exist between neighboring fringe lineson the detector; and, if neighboring fringe lines are understood to mapto sample stage traces that are spaced a distance of Y apart as a resultof the calibration process—then, a per pixel resolution of 0.1Y in boththe x and y directions may be said to exist. In this case, for example,a string of 5 consecutive pixels along the x axis of the detector can berecognized as mapping to a distance of 0.5Y over the surface of thesample stage (or sample); and, likewise, a string of 5 consecutivepixels along the z axis of the detector can be recognized as mapping toa distance of 0.5Y over the surface of the sample stage (or sample).

[0076] Here, recalling that a pre-established measurement scale can bepartially formed by recording information related to the mapping of thedetector's fringe lines to the sample stage, note that storing this perpixel resolution in the x and y direction qualifies as storinginformation that can be used toward this objective. For example, if theper pixel resolution in the x and y direction corresponds to a distanceof 0.1Y; then, undisturbed fringe lines detected to be 30 pixels apartalong the z axis of the detector can be recognized as representingtraces spaced a distance of 3Y apart along the y axis of the samplestage. Similarly, if fringe lines extend 100 pixels across the x axis ofthe detector; then, these same fringe lines may be recognized as tracesthat run over a distance of 10Y along the x axis of the sample.

[0077] Lastly, note that distinction should be drawn between thepreviously discussed “per pixel unit of sample height measurement” (and,which is discussed in more detail immediately below) and the justdiscussed “per pixel” distance along the x and y axis of the samplestage. Better said, according to the present measurement technique,pixel locations can be used not only to identify a specific position inthe xy plane of the sample stage but also to identify sample heightalong the z axis above the sample stage. The “per pixel” distance alongthe x and y axis of the sample stage is devoted to the former; while,the “per pixel unit of sample height measurement” is devoted to thelater.

[0078] 3.2 Calculation of Per Pixel Unit of Sample Height Measurement

[0079] Referring back to FIG. 6, with the fringe lines being aligned 610to a calibration standard (e.g., and perhaps a “per pixel” resolution inthe x and y directions being recorded), the next procedure inestablishing a measurement scale is calculating 611 the per pixel unitof sample height measurement. Recall from the discussion of FIG. 6 thatthe “per pixel unit of sample height measurement” represents the amountof unit distance along the z axis above the sample stage that a fringeline disturbance of one pixel along the z axis of the detectortranslates to. As interferometry is based upon optical path lengthdifferences between light directed to the reference mirror and lightdirected to the sample stage, the introduction of a sample to the samplestage effectively changes the optical path length differences thatexisted prior to its introduction. Better said, at least a portion ofthe light that is directed to the sample stage (rather than the tiltedreference mirror) will have its optical path length shortened because itwill reflect off of the sample rather than the sample stage.

[0080] This shortened optical path length corresponds to change inoptical path length difference; which, in turn, causes a disturbance tothe position of a fringe line. Thus, in order to calculate the per pixelunit of sample height measurement, the amount of disturbance in thepositioning of a fringe line should be correlated to the change inoptical path length that occurs when a sample is placed on the samplestage. Here, in order to better comprehend the change in optical pathlength, an analysis of an interferometer without a sample is in order;and, an analysis of an interferometer with a sample is in order. FIGS.4a and 9 a relate to the optics of an interferometer without a sample;and, FIG. 9b relates to the optics of an interferometer with a sample. Adiscussion of each of these immediately follows. By way of comparing theoptical conditions that exist with and without a sample (with particularfocus on the change in optical path length), the per pixel unit ofsample height measurement will be deduced.

[0081] Referring now to FIG. 4a, assume a first distance 493 representsa distance of A between the θ=0° reference plane 499 and the tiltedreference mirror 404; and, a second distance 494 represents a distanceof 3λ/2 between the θ=0° reference plane 499 and the tilted referencemirror 404. It can be shown that, when a sample is not placed on thesample stage, a fringe line appears for every integer spacing of λ/2between the tilted reference mirror 404 and the θ=0° reference plane499. Thus, for example, a first fringe line 495 appears on the detector405 as a result of the first distance 493; and, a second fringe line 496appears on the detector 405 as a result of the second distance 494.

[0082] This property can be viewed “as if” there is a relationshipbetween: 1) the “intercepts” on the tilted reference mirror 404 of eachinteger spacing of λ/2 between the tilted reference mirror 404 and theθ=0° reference plane 499; and, 2) the location of the fringe lines onthe detector itself 405. Better said, recalling from the discussion ofFIG. 3 that fringe lines 495, 496 are separated from one anotheraccording to ˜λ/θ, note also that the intercepts 497, 498 of distances493, 494 with the tilted reference mirror 404 are spaced λ/(2 sinθ)apart along the plane of the tilted reference mirror 404 (becausedistance 494 is λ/2 longer than distance 493; and, from basic geometry,the hypothenous of a right triangle is a leg of the triangle (λ/2)divided by the sin of the angle opposite the leg (sinθ)).

[0083] Here, as ˜λ/θ is consistent with λ/(2 sinθ) (particularly for asmall angle of θ), a correlated relationship can therefore be envisionedbetween the: 1) the spacing between the intercepts upon the tiltedreference mirror 404 of each integer λ/2 spacing between the tiltedreference mirror 404 and the θ=0° reference plane 499; and, 2) thespacing between the fringe lines that appear on the detector 405.

[0084]FIGS. 9a and 9 b show an example of the change in fringe lineposition that occurs when a sample is placed on a sample stage. Inparticular, FIG. 9a provides further optical analysis when a sample isnot placed on the sample stage; and, FIG. 9b provides an opticalanalysis when a sample is placed on the sample stage. By comparing thepair of analysis, a suitable understanding of the per pixel unit ofsample height measurement can be formulated.

[0085] Like FIG. 4a, FIG. 9a shows an interferometer 910 without asample on its sample stage 903 a. When an interferometer does not have asample on its sample stage 903 a, the variation in optical path lengthdifference between light directed to the sample stage 903 a and lightdirected to the tilted reference mirror 904 a (that causes theappearance of fringe lines on the detector 905 a) is largely a functionof the distance between the θ=0° reference plane 999 a and the tiltedreference mirror 904 a. Here, when a sample is not placed on the samplestage 903 a, all light directed to the sample stage 903 a travels thesame distance d1 in traveling from the splitter 902 a to the samplestage 903 a (and back again).

[0086] Thus, the “variation” in path length from the splitter 902 a tothe tilted reference mirror 904 a can be viewed as the “primarycontributor” to the “variation” in optical path length difference thatoccurs between light directed to the sample stage 903 a and lightdirected to the tilted reference mirror 904 a; which, in turn, causesthe appearance of multiple fringe lines on the detector 905 a. Here, asthe “variation” in path length from the splitter 902 a to the tiltedreference mirror 904 a clearly occurs within the region between the θ=0°reference plane 999 a and the tilted reference mirror 904 a, the regionbetween the θ=0° reference plane 999 a and the tilted reference mirror904 a serves as a primary region on which to focus the optical analysis.

[0087] Recall that, without a sample being placed on the sample stage903 a, a fringe line appears for every integer spacing of λ/2 betweenthe tilted reference mirror 904 a and the θ=0° reference plane 999 a;and that, a correlating relationship can be envisioned between thespacing of the fringe lines on the detector and the intercept spacingson the tilted reference mirror 404. As such, FIG. 9a shows a firstfringe line 995 a across a portion of a CCD detector 905 a that resultsfrom a spacing 993 a of A between the θ=0° reference plane 999 a and thetilted reference mirror 904 a; and, a second fringe line 996 a acrossthe same portion of a CCD detector 905 a that results from a spacing 994a of 3λ/2 between the θ=0° reference plane 999 a and the tiltedreference mirror 904 a.

[0088] Referring to FIG. 9b, note that a sample 912 has been placed onthe sample stage 903 b of the interferometer 911. Here, it is assumedthat the sample 912: 1) has a height (as measured along the z axis) ofλ/4; and, 2) is positioned at a y axis location on the sample stage 903b that mapped to fringe line 995 a prior to introduction of the sample912 (as observed in FIG. 9a). In this case, the proper optical analysiscan be performed by superimposing the shape of the sample 912 over theθ=0° reference plane 999 b at the location of spacing 993 a that existedprior to the introduction of the sample 912.

[0089]FIG. 9b shows this superposition, which, in turn, modifies theshape of the reference plane 999 b. Here, superimposing the shape of thesample at the location of spacing 993 a reflects the fact that: 1) thesample 912 is positioned at a y axis location on the sample stage 903 bthat mapped to fringe line 995 a (because spacing 993 a “caused” theappearance of fringe line 995 a); and, 2) a change in optical pathlength of λ/4 is caused to that portion of light that is now reflectingoff of the sample (rather than off of the sample stage).

[0090] The change in optical path length causes a disturbance to theposition of the fringe line 995 a because the optical path lengthdifference (as between light directed to the sample stage and lightdirected to the reference mirror) has been changed by the introductionof the sample. As such, fringe line 995 a moves down along the detector905 b to a new position (as observed in FIG. 9b by fringe line 995 b).The new position for the fringe line 995 b corresponds to the samelength of spacing 993 b (i.e., A) between the reference plane 999 b andthe tilted reference mirror 904 b that existed before introduction ofthe sample. However, the modification to the shape of the referenceplace caused by the shape of the sample 912 effectively brings the samelength spacing 993 b to a lower position along the z axis. As such, thefringe line 995 b also moves down to a lower position on the surface ofthe detector 905 b.

[0091] Here, a change of λ/4 drops the fringe line 995 b halfway betweenits original position 907 (before introduction of the sample 912) andfringe line 996 b. This arises naturally when one considers that spacing993 b can be broken down into a first segment that is 3λ/4 in length anda second segment that is λ/4 in length (noting that a total length of λfor spacing 993 b is preserved). The λ/4 segment helps form a righttriangle (observed in FIG. 9b) with the tilted reference mirror 904 b;which, from basic geometry, indicates that the intercept of spacing 993b with the tilted reference mirror 904 b will move λ/(4 sinθ) along theplane of the reference mirror 904 b as a consequence of the sample 912being introduced to the interferometer 911. Since, there is correlatingrelationship between the location of the “intercept” on the tiltedreference mirror 904 b and the location of the fringe line 995 b on thedetector itself 905 b, this corresponds to the movement of the fringeline 995 b consuming one half of the distance that once separated itfrom fringe line 996 b.

[0092] Consistent with the analysis provided just above, note that asample 912 height of λ/2 would have caused fringe line 995 b to drop farenough so as to completely overlap fringe line 996 b. As such, it isapparent that the “per pixel unit of sample height measurement” can becalculated as λ/(2N) where N is the number of pixels between neighboringfringe lines on the CCD detector 905 a when a sample is not placed onthe sample stage 904 a (as observed in FIG. 9a). For example, referringto FIG. 9a, note that there are 10 pixels between neighboring fringelines 995 a and 996 a. For a light source having a wavelength of λ=20nm, this corresponds to a “per pixel unit of sample height measurement”of 1 nm per pixel (i.e., 20 nm/20 pixel=1 nm/pixel). As such, becausethe introduction of the sample caused fringe line 556 a,b to move fivepixels, in this example, the sample height can be precisely calculatedas 5 nm.

[0093] Referring then back to FIG. 6, the “per pixel unit of sampleheight measurement” can be calculated 611 from the wavelength of thelight source λ; and, the number of pixels that are observed to existbetween fringe lines when a sample is not placed onto the sample stage.Here, note that the process of aligning 610 the fringe lines with thecalibration standard may adjust the spacing between fringe lines on thedetector; and, as such, the calculation 611 of the “per pixel unit ofsample height measurement” should be made after the position of thefringe lines have been aligned 610.

[0094] In an embodiment, once the “per pixel unit of sample heightmeasurement” is calculated 611, information related to the mapping ofthe detector's fringe lines to the sample stage is stored 612 along withthe “per pixel unit of sample height measurement”; which, as alreadydiscussed above, corresponds to the storage of information that can beused to effectively construct a measurement scale against which fringeline changes can be measured to determine the topography of a sample.

[0095] 4.0 Embodiment of Apparatus

[0096]FIG. 10A shows an embodiment of a test measurement system that iscapable of determining a surface topography by comparing the fringelines that emerge when a sample is placed on the sample stage 1003against a pre-established measurement scale. The test measurement systemof FIG. 10A includes a light source 1001 and a splitter 1002. The lightsource may be implemented with different types of light sources such asa gas laser, a semiconductor laser, a tunable laser, etc. A collimatinglens or other device may be used to form planar wavefronts from thelight from the light source 1001. The splitter 1002 is oriented todirect a first portion of the light from the light source to a referencemirror 1004; and, a second portion of the light from the light sourcetoward a sample stage 1003. The splitter 1002 may be implemented with anumber of different optical pieces such as glass, pellicle, etc.

[0097] In order to properly direct light as described above, thesplitter 1002 is positioned at an angle α with respect to a plane wherea surface topology measurement is made (e.g., the xy plane as seen inFIG. 10A). In a further embodiment, α=45°; but those of ordinary skillwill be able to determine and implement a different angle as appropriatefor their particular application. The splitter 1002 may also be designedto direct 50% of the light from the light from the light source 1001toward the reference mirror 1004 and another 50% of the light from thelight from the light source 1001 toward the sample stage 1003. But,those of ordinary skill will be able to determine other workablepercentages.

[0098] In a broader sense, the reference mirror 1004 may be viewed as anembodiment of a reflecting plane that reflects light back to thesplitter 1002. A reflecting plane may be implemented with a number ofdifferent elements such as any suitable reflective coating formed over aplanar surface. The reflecting plane may be tilted at an angle θ so thatsuitably spaced fringe lines appear along the surface of a detector1005. As discussed, the positioning of θ can be adjusted in order toalign the fringe lines to a calibration standard.

[0099] The sample stage 1003 supports the test sample whose surfacetopography is to be measured. After light is reflected from the samplestage 1003 and/or a sample placed on the sample stage 1003, it iscombined with light reflected from the reference mirror 1004. Thecombined light is then directed to detector 1005. In a broader sense,the detector 1005 may be viewed as an opto-electronic converter thatconverts the optical intensity pattern at the detector surface into anelectric representation. For example, as discussed previously, thedetector 1005 can be implemented as a charge coupled device (CCD) arraythat is divided into a plurality of pixels over the surface where lightis received. Here, an output signal is provided for each pixel that isrepresentative of the intensity received at the pixel.

[0100] A fringe detection unit 1006 processes the data that is generatedby the detector 1005. The fringe detection unit 1006 is responsible fordetecting the position(s) of the various fringes that appear on thedetector 1005. An embodiment of a fringe detection unit 1006 isdescribed in more detail below with respect to FIGS. 11a through 11 c;however, it is important to recognize that the fringe detection unit1006 can be implemented in vast number of ways. For example, the fringedetection unit 1006 may be implemented as a motherboard (having acentral processing unit (CPU)) within a computing system (such as apersonal computer (PC), workstation, etc.). Here, the detection offringes may be performed with a software program that is executed by themotherboard. In other embodiments, the fringe detection unit 1006 may beimplemented with dedicated hardware (e.g., one or more semiconductorchips) rather than a software program. In other embodiments, somecombination of dedicated hardware and software may be used to detect thefringes.

[0101]FIGS. 11a through 11 c elaborate further on at least oneembodiment of the fringe detection unit. FIG. 1a provides a methodology1100 for performing fringe detection. FIG. 11b provides an embodiment ofa dedicated hardware circuit 1150 that effectively performs themethodology of FIG. 11a. FIG. 11c displays waveforms that are applicableto the circuit of FIG. 11b. According to the methodology of FIG. 11a,fringes are detected by taking the first derivative 1104 of a column ofdetector array data. A column of detector array data is the collectionof optical intensity values from the pixels that run along the samecolumn of a detector's pixel array. For example, if array 1101 of FIG.11a is viewed as the CCD detector of an interferometer, a first column1102 that traverses the array will encompass a “first” column of CCDdata, a second column 1103 that traverses the array will encompass a“second” column of CCD data, etc.

[0102] The optical intensity values from a column of CCD data shouldindicate a series of relative minima. That is, as each column of CCDdata corresponds to a “string” of optical intensity values that impingethe CCD detector along the z axis and at the same x axis location, ifthe optical intensity values are plotted with respect to their z axislocation, a collection of relative minimum points should appear. Thisfollows naturally when one refers, for example, back to FIG. 3 andrecognizes that by traveling along the optical intensity pattern 350 inthe +z direction at a fixed x coordinate a series of relative minimawill be revealed (e.g., at locations that correspond to fringe lines 352a, 352 b, 352 c). Another example is provided in FIG. 11c where atypical distribution 1112 of optical intensity values along the z axisand at a fixed x location of the detector is presented.

[0103] From the depiction of FIG. 11c, each relative minimum (e.g., atpoints z₂, z₄, z₆, z₈, etc.) will correspond to a fringe line (recallingthat a fringe line corresponds to a relative minimum optical intensityas a result of destructive interference). As such, the pixel locationson the detector where fringe lines appear can be precisely identified.Better said, as the x coordinate of the column of CCD data beinganalyzed is known (e.g., x_(n)); and, as the fringe detection processidentifies specific z axis coordinates where a fringe line appears(e.g., z₂, z₄, z₆, z₈, etc.), a set of pixel coordinates (e.g.,(x_(n),z₂); (x_(n),z₄); (x_(n),z₆); (x_(n),z₈);, etc.) that define thelocation of each instance of a fringe line can be readily identified foreach analysis of a column CCD data.

[0104] Taking the first derivative 1104 of a column of CCD data (withrespect to the z axis) and then determining 1105 where the firstderivative changes from a negative polarity to a positive polarity is away to identify the z coordinate for each pixel that receives a fringeline for a particular column of CCD data. Although such an approachcould be done in software, hardware or a combination of the two, FIGS.11b and 11 c relate to an approach that uses dedicated hardware. Here, acolumn of CCD data represented by waveform 1112 is provided to input1108. The column of CCD data 1112 is then presented to both a comparator1106 and a delay unit 1107. The delay unit effectively provides adelayed or shifted version of the column of CCD data 1112 (as observedwith waveform 1113).

[0105] The comparator 1109 indicates which of the pair of waveforms1112, 1113 is greater. Waveform 1114 provides an example of thecomparator output 1109 signal that is generated in response to waveforms1112, 1113. Note that a rising edge is triggered for each relativeminima (e.g., at points z₂, z₄, z₆, z₈, etc.). One of ordinary skillwill recognize that indicating which of the pair of waveforms 1112, 1113is greater mathematically corresponds to taking the first derivative1105 of waveform 1112 and determining its polarity. Here, determiningwhere the polarity changes from negative to positive corresponds toidentifying a relative minimum (because the slope of a waveform changesfrom negative to positive at a relative minimum). As such, as seen inFIG. 11c, each rising edge of the comparator output signal should lineup with each relative minima of the column of CCD data.

[0106] 4.0 Embodiment of A Pre-Established Measurement Scale and ATopography Measurement Based Thereon

[0107] Referring back to FIG. 10A; and, with a description of anembodiment for the fringe detection unit 1006 having been completed (asdescribed just above with respect to FIGS. 11a through 11 c), thepresent section discusses at length an embodiment of the operation ofthe topography measurement unit 1007. The operation of the topographymeasurement unit is discussed by way of describing how a precisetopography description can be developed. However, before commencing sucha discussion, a brief review of the overall methodology will be providedas well as a brief digression into specific details concerning theestablishment of the measurement scale.

[0108] Referring back to FIG. 5, recall that a measurement scale isfirst established 501 before a topography measurement is made 503. Here,FIGS. 6 through 9b helped illustrate that the measurement scale can bedeveloped by: 1) aligning the fringe lines to a calibration standardwithout a sample being placed on the sample stage; 2) recognizing themapping of the detector's fringe lines to the sample stage; and, 3)recognizing the per pixel unit of sample height measurement. Thus, in anembodiment, the storage of measurement scale information involves thestoring of the fringe line positions of an interferometeric image when asample has not been introduced to the interferometer. This effectivelyacts as a baseline against which the fringe line disturbances that occurin response to a sample being introduced to the interferometer arecompared.

[0109] From the discussion of fringe line detection (as performed by thefringe detection unit 1006) provided just above with respect to FIGS.11a through 11 c, it is apparent that the location of the fringe linesover the entirety of the detector 1005 can be determined by performing afringe detection analysis for each detector column. Thus, a measurementscale can be created by: 1) aligning the fringe lines to the calibrationstandard without a sample being introduced to the interferometer; 2)detecting the pixel locations where the fringe lines appear on thedetector (e.g., by performing fringe detection for each detectorcolumn); 3) storing these pixel locations; 4) storing or otherwiserecognizing the distance between tracings on the sample stage (asdetermined through the manner in which the fringe lines map to thesample stage—for example, with the help of a per pixel resolution in thex and y direction parameter)—or, by simply recording the calibrationstandard spacing; and 5) storing or otherwise recognizing the per pixelunit of sample height measurement based upon the fringe line separation.

[0110]FIG. 12a represents the pixel location information which may bestored to help form a stored measurement scale. Here, an array ofdetector pixel locations are observed and an “X” is placed in eachlocation where a fringe line is detected when a sample is not placed onthe sample stage. Thus, as seen in the example of FIG. 12a, five fringelines 1201, 1202, 1203, 1204 and 1205 are detected. The components ofinformation that can be stored so that a measurement scale can beutilized therefrom may therefore include: 1) the understood spacingbetween the tracings on the xy plane of the sample stage that the fringeline separations observed on the detector map to (and/or a parameterfrom which the spacing can be determined such as the per pixel change inx and y direction parameter discussed previously); 2) the location ofeach fringe line on the detector (e.g., the (x,z) pixel coordinate ofeach pixel having an “X” in FIG. 12); and 3) the “per pixel unit ofsample height measurement” as calculated once the tilt angle of thereference mirror is established. The relevance of each of these isdescribed immediately below.

[0111] Recall from FIG. 8 that the alignment of the fringe lines 811a-811 e to the calibration standard markings 810 a-810 e allow thefringe lines 811 a-811 e to respectively map to sample stage tracingsthat are spaced a distance of “Y” apart along the y axis of the samplestage. FIG. 12a demonstrates that the stored measurement scalerecognizes the separation along the y axis of the sample for eachdetected fringe line. For example, as just one approach, one fringe line(e.g., fringe line 1203) may be recognized as the “baseline” fringehaving a corresponding (i.e., “mapped to”) y axis location on thesampled stage defined at y=0.

[0112] In an embodiment where each fringe line maps to a trace that runsalong the x axis of the sample and that is spaced Y apart from the traceof a neighboring fringe line on the sample stage, trace 1204 willcorrespond to a y axis location on the sample of y=−Y and trace 1202will correspond to a y axis location on the sample of y=+Y. Similarly,trace 1205 will correspond to a y axis location on the sample of y=−2Yand trace 1201 will correspond to a y axis location on the sample ofy=+2Y. Note that, briefly referring back to FIG. 4a, “higher” fringelines on the z axis of the detector 405 will map to “lower” positionsalong the y axis of the detector. As such, the fringe lines 1202, 1201positioned below the baseline fringe 1203 are given a positive polarity;while fringe lines 1204, 1205 positioned above the baseline fringe 1203are given a negative polarity.

[0113] Keeping track of the location of each fringe line on the detector(e.g., the (x,z) pixel coordinate of each pixel having an “X” in FIG.12a), effectively corresponds to the location of a number of different“sub” measurement scales that are located at a specific y axis locationsalong the sample stage surface. FIG. 12b shows a drawing of thisperspective where a collection of measurement scales that each measuresample height along the x axis at a unique y axis location are observed.That is, another way of looking at the pre-established measurementscale, for embodiments where fringe line spacings map to a distance of Yupon the sample stage, is a translation of information received on thedetector to a plurality of measurement scales that: 1) are spaced aparta distance Y along the y axis of the sample stage; 2) stand “upright” onthe sample stage so as to measure sample height above the sample stage(via the “per pixel unit of measurement height” parameter); and 3) runalong the x axis of the detector.

[0114] Note that keeping track of the fringe detection locationscorresponds to a degree of data compression because pixel coordinatesthat are not associated with a fringe line (i.e., those not having an“X” in FIG. 12) can be disposed of. Furthermore, as a case of furtherdata compression, if all the fringe detections for a particular fringeline (e.g., each “X” associated with fringe line 1205) lay along thesame z axis coordinate—only one data value needs to be stored torepresent the entire fringe line (i.e., the z axis coordinate). In orderto properly record measurement scale information, the per pixel unit ofsample height measurement is also recorded. Note that if “bending”appears in the fringe lines (e.g., due to imperfect optics) correctionfactors may be applied on a pixel by pixel basis to the fringe line datain order to “straighten out” a fringe line.

[0115] As described above with respect to FIGS. 9a and 9 b; and, asdescribed immediately below, the per pixel unit of sample heightmeasurement is used to help define the height of the sample at aparticular location by factoring it with the disturbance (in pixels)that occurs at a particular (x,z) coordinate location in response to asample being placed on the sample stage. In a sense, each pixel on thedetector corresponds to a “tick” along the vertical axis (i.e., alongthe z axis) of any of the measurement scales observed in FIG. 12b;where, the distance between “ticks” is the per pixel unit of sampleheight.

[0116]FIG. 13 shows a representation of the fringe lines of FIG. 12aafter they have been disturbed in response to the placement of a sampleon the sample stage. Here, fringe line 1301 of FIG. 13 corresponds tofringe line 1201 of FIG. 12a, fringe line 1302 of FIG. 13 corresponds tofringe line 1202 a of FIG. 12, etc. Note that the fringe lines 1301-1305of FIG. 13 also correspond to the fringe lines 451 e through 451 a ofFIG. 4b that trace out the profile of a sample 460 having a trapezoidalshape. FIG. 14 shows the result when the differences betweencorresponding fringe lines from FIGS. 13 and 12a (i.e., the fringe linedisturbances) are calculated. For example, by subtracting the fringelines of FIG. 12a from their corresponding fringe lines of FIG. 13(i.e., subtracting fringe line 1205 from fringe line 1305, subtractingfringe line 1204 from fringe line 1304, etc.) and multiplying by −1 (tocorrect for the inverted topography profiles observed in FIG. 13) theprofiles 1401 through 1405 of FIG. 14 will result.

[0117] Each profile 1401 through 1405 corresponds to an accuratedescription of the sample's topography at the y axis locations that aredefined by the measurement scale. Note that topography profiles 1401through 1405 are measured vertically in terms of pixels; and, as aresult, the “per pixel unit of sample height measurement” parameter canbe used to precisely define the sample's height at each x axis location.For example, note that the trapezoid profile reaches a maximum height of3 pixels. Here, if the “per pixel unit of sample height measurement”parameter corresponds to 1 nm per pixel, the sample will have a measuredmaximum height of 3 nm.

[0118] While FIGS. 12a, 13 and 14 helped to describe an embodiment ofthe operation of the topography measurement unit 1007 of FIG. 10A, FIG.15 shows an embodiment 1507 of a circuit design for the topographymeasurement unit 1007 observed in FIG. 10A. According to the design ofFIG. 15, the stored measured scale data and disturbed fringe line dataare received at inputs 1522 and 1521, respectively. Here, informationassociated with FIG. 12a may be regarded as some of the storedmeasurement scale data (excluding the per pixel unit of sample of heightand the sample stage y axis location that each undisturbed fringe linecorresponds to); and, the fringe line patterns observed in FIG. 13 maybe regarded as an example of disturbed fringe line data responsive to asample being placed on the sample stage. In this case, note that input1521 of FIG. 15 corresponds to input 1021 of FIG. 10A; and, input 1522of FIG. 15 corresponds to input 1022 of FIG. 10A. Note that, in theparticular embodiment of FIG. 10A, the sample data and the storedmeasurement scale data are extracted from their own memory regions1024,1023. If a common memory is used, inputs 1021,1022 may merge to acommon data path.

[0119] The fringe line extraction unit 1501 extracts correspondingfringe lines for comparison from their appropriate memory regions 1523,1524. Here, corresponding pairs of fringe lines may be extracted inlight of the manner in which they were stored. For example, if the zaxis pixel coordinates for a first fringe line associated with themeasurement scale information (e.g., fringe line 1201 of FIG. 12) may beautomatically stored (by the detection unit 1006) in a first region ofmemory 1524; and, if the z axis pixel coordinates for a first disturbedfringe line associated with sample information (e.g., fringe line 1301of FIG. 13) is automatically stored in a first region of memory 1523 (bythe detection unit 1006), these same sets of fringe line data may beextracted by the fringe line extraction unit 1501 by automaticallyreferring to these same memory regions. Thus, fringe lines 1201 and 1301may be presented together at inputs 1522,1521, respectively; fringelines 1202 and 1302 may be presented together at inputs 1522, 1521,respectively;, etc.

[0120] The sample stage y axis location for these fringe lines may bekept track of (e.g., by being stored along with the pixel locations ofeach undisturbed fringe line in memory 1524) so that the analysis of thepair of fringe lines that are together presented at inputs 1522, 1521can be traced to a specific sample stage y axis location. Once a pair ofcorresponding fringe lines have been extracted, the differences betweenthe disturbed and disturbed locations are calculated and then multipliedby −1 to properly invert the data (note that the factor of −1 may beremoved if the reference mirror tilt angle is pivoted at the bottom ofthe reference mirror rather than the top (as observed throughout thepresent description)).

[0121] This creates a new string of data that represents the sampleprofile (as measured in pixels) at the y axis location of the samplestage that the pairs of fringe lines correspond to (e.g., profile 1402of FIG. 14). As such, multiplication of the pixel count at each x axiscoordinate by the “per pixel unit of sample height measurement”parameter should produce the correct sample profile from the pair offringe lines. Beyond the topography measurement unit, the topographyprofiles may be stored or displayed. They may also be compressed throughvarious data compression techniques to reduce the amount of data to behandled.

[0122] Referring back to FIG. 10A, it is important to recognize that thetopography measurement unit 1007 can be implemented in a vast number ofways and according to a vast number of different processing schemes. Forexample, the entire unit 1007 may be implemented with a motherboard(having a central processing unit (CPU)) within a computing system (suchas a personal computer (PC), workstation, etc.). Here, the developmentof topography profiles may be performed with a software program that isexecuted by the motherboard. Note that if the function of both thefringe line detection unit 1006 and the topography measurement unit 1007are implemented in software, a computing system may be employed afterthe O/E converter 1005 to perform the complete topography measurementanalysis.

[0123] As such, whether or not (or to what degree) data processing isperformed through the execution of a software routine and/or dedicatedhardware, the processing that is performed “behind” the detector may beviewed, more generically, as being performed by a “data processing unit”1020. Here, the data processing 1020 unit may be implemented asdedicated hardware (e.g., as suggested by FIG. 10A); or, alternativelyor in combination, may be implemented with a computing system. Anembodiment of a computing system is shown in FIG. 10B. General purposeprocessors, digital signal processors (DSPs) and/or generalpurpose/digital signal hybrid processors may be employed as appropriateas well.

[0124] Thus, any of the signal processing techniques described hereinmay be stored upon a machine readable medium in the form of executableinstructions. As such, it is also to be understood that embodiments ofthis invention may be used as or to support a software program executedupon some form of processing core (such as the Central Processing Unit(CPU) of a computer) or otherwise implemented or realized upon or withina machine readable medium. A machine readable medium includes anymechanism for storing or transmitting information in a form readable bya machine (e.g., a computer). For example, a machine readable mediumincludes read only memory (ROM); random access memory (RAM); magneticdisk storage media; optical storage media; flash memory devices;electrical, optical, acoustical or other form of propagated signals(e.g., carrier waves, infrared signals, digital signals, etc.); etc.

[0125]FIG. 10B shows an embodiment of a computing system 1000 that canexecute instructions residing on a machine readable medium (noting thatother (e.g., more elaborate) computing system embodiments are possible.In one embodiment, the machine readable medium may be a fixed mediumsuch as a hard disk drive 1002. In other embodiments, the machinereadable medium may be movable such as a CD ROM 1003, a compact disc, amagnetic tape, etc. The instructions (or portions thereof) that arestored on the machine readable medium are loaded into memory (e.g., aRandom Access Memory (RAM)) 1005; and, the processing core 1006 thenexecutes the instructions. The instructions may also be received througha network interface 1007 prior to their being loaded into memory 1005.

[0126] In other embodiments, the topography measurement unit 1006 may beimplemented with dedicated hardware (e.g., one or more semiconductorchips) rather than a software program. In other embodiments, somecombination of dedicated hardware and software may be used to developthe topography profiles. Further still, multiple topography profiles maybe analyzed in parallel (e.g., with multiple implementations of thecircuitry of FIG. 15 that simultaneously operate on different sets offringe line pairs).

[0127] 5.0 High Resolution Topographical Description ThroughInterleaving of Multiple Topographical Measurements

[0128]FIGS. 16a, 16 b and 17 relate to a technique for enhancing theoverall resolution of the topography measurement along the y axis of thesample stage. Referring back to FIG. 10A, note that a stepper motor iscoupled to the sample stage 1003 which can move the stage along the yaxis. Here, for a trace separation of Y as discussed at length above,the sample stage can be moved a distance (e.g., less than Y) toeffectively enhance the trace separation resolution.

[0129] For example, if the sample stage were moved along the y axis byan amount Y/2, the tracings of the fringe lines would effectively “move”so as to trace over new locations of the sample. FIG. 16b demonstratesan example of these new tracings. Note that these tracings may becompared to the tracings originally observed in FIG. 4b so as to comparethe manner in which they have moved. FIG. 16a provides the “new” samplefringes that are detected in response.

[0130]FIG. 17 provides an embodiment of the more thorough topographydescription that results when the topography information from FIGS. 13and 16a are combined by aligning or otherwise interleaving theirprofiles at the appropriate y axis locations. The more thoroughtopography information may be subsequently stored into volatile memory(e.g., a semiconductor memory chip) or non-volatile memory (e.g., a harddisk storage device); and/or may be displayed on a screen so that thetopography information can be easily viewed. Note that the controlapplied to the stepper motor 1008 may be overseen by the data processingunit 1020 of FIG. 10A; and, as such, consistent with the descriptionprovided so far, such control may be managed by software, dedicatedhardware or a combination thereof.

[0131] It is important to note that other approaches can be used toeffectively achieve the same or similar effect as described just above.That is, other optical techniques may be employed in order toeffectively provide collections of tracings that can be interleavedtogether so as to form a higher resolution image of the overall sample.For example, according to one approach, the phase of the light emanatingfrom the light source is adjusted in order to “adjust” the positioningof the fringe lines on the detector. Here, the activity of altering thephase of the light will have a similar effect to that of moving thesample stage as discussed above with respect to FIGS. 16a, 16 b and 17.

[0132] That is, a new relative positioning of the mapping of the fringelines traces over the sample will arise; which, in turn, creates a “new”set of tracings that can be interleaved with other sets of tracings(formed at different sample stage and/or light phase positionings) so asto form high resolution topography images. According to another relatedapproach, the position of the tilted reference mirror is moved along theoptical path axis (e.g., along the y axis as depicted in FIG. 10A) to“adjust” the positioning of the fringe lines.

[0133] Again, a new relative positioning of the mapping of the fringelines traces over the sample will arise; which, in turn, creates a “new”set of tracings that can be interleaved with other sets of tracings.Further still, different light wavelengths may be employed (e.g.,different “colors” of light may be used). Here, however, a separatemeasurement scale should be established for each wavelength of lightthat is employed.

[0134] Regardless as to whether or not or which technique (orcombination of techniques) is used to create different sets ofinterleavable tracings, a word about magnification and the fringe linesis also in order. With respect to magnification, referring back to FIG.10A, note that a magnifying lens 1010 is included. The “per pixel unitof sample height measurement” parameter and the “per pixel unit ofdistance along the x and y directions of the sample stage” parameter canbe enhanced by incorporating magnification into the interferometer. Forexample, if without magnification there exist 10 pixels betweenneighboring fringe lines (e.g., as observed in FIG. 9a), providing 10×magnification will effectively move neighboring fringe lines to be 100pixels apart rather than 10 pixels apart. Because the fringe lines arestill to be regarded as being separated by a distance of λ/2, the perpixel unit of sample height measurement may still be determined fromλ/(2N). As such, a tenfold increase in N corresponds to a tenfoldincrease in per change in sample height.

[0135] With respect to fringe lines, note also that (as discussed) thefringe lines observed in FIG. 3 correspond to relative minima locationsobserved within the optical intensity pattern 350. More generally, asappropriate, fringe lines can be construed as any looked for intensityfeature within the optical intensity pattern (e.g., relative minimumpositions; relative maximum positions, etc.) whose position(s) is/aredisturbed in a manner as described in the preceding description as aconsequence of a sample being introduced to the sample stage. Lastly,note also that stepper motor 1009 can be used to adjust the position ofthe reference mirror 1004 along the y axis and/or adjust the tilt angleof the reference mirror.

[0136] 6.0 Characterization of Sample Composition Through Analysis ofFringe Line Intensity Information

[0137]FIGS. 18a through 18 b relate to an ensuing discussion thatdescribes how the material composition of a sample can be determinedthrough analysis of the intensity values of the fringe lines that aredetected from the interferometer detector. That, is recalling thediscussion of FIGS. 11a through 11 c and 12 a, note that the detectionof fringe lines involves the identification of particular pixellocations. As such, once fringe lines have been successfully detected,the optical intensity data used to determine the fringe lines may bedisposed of. According a measurement technique described in the presentsection, however, the optical intensity information is regarded asuseful information from which further characterization of the sample,beyond surface topography, may be developed.

[0138] More specifically, the material(s) from which the surface(s) ofthe sample are comprised may be determined by characterizing thereflectivity of the sample surface as a function of the opticalwavelength of the interferometer's lightsource. The solid linedgraphical component of FIG. 18a provides an exemplary depiction of a“reflectivity vs. wavelength” curve. Here, as reflectivity vs.wavelength is a function of the micro-structural details of a reflectingsurface such as conductivity, lattice spacing, lattice type, etc.,; and,as particular materials or substances (e.g., a pure material such asCobalt (Co); or, an alloy or other combination of materials such asSilicon Nitride (Si₃N₄), “Nickel Iron” (Ni_(100-x)Fe_(x)), etc.) haveparticular values for these same micro-structural details, the“reflectivity vs. wavelength” curve of a particular material orsubstance often uniquely defines it.

[0139] Better said, different materials or substances tend to exhibitdifferent “reflectivity vs. wavelength” curves; and, as such, bydeveloping a sample's “reflectivity vs. wavelength” curve, the materialor substance from which it (the sample) is comprised can be determined.Here, rather than disposing the optical intensity values observed at thedetector, they may be analyzed so as to determine a particularreflectivity of the sample for a particular wavelength of theinterferometer's optical source.

[0140] By changing the optical source's wavelength; and, by monitoringthe change in reflectivity of the sample in response thereto, a“reflectivity vs. wavelength” curve can be measured for the sample.This, in turn, can be used to determine the material composition(s) ofthe sample itself. FIG. 18a provides exemplary results from such ameasurement where specific measured reflectivity data points are plottedvs. the applied wavelength. As the data points trace out thereflectivity curve of the sample, the composition of the sample can bedetermined.

[0141] In various embodiments, optical intensities observed at the pixellocations where fringe lines are detected are used to perform thereflectivity analysis. Thus, in some cases, not only are the pixellocations of detected fringe lines employed (to develop the surfacetopography description of the sample); but also, the optical intensityvalues of the same fringe lines are used to help characterize thematerial(s) from which the sample is comprised.

[0142] However note also that, seizing upon the notion that a fringeline may be construed where appropriate so as to correspond to somethingother than a relative minimum, it some cases it may useful to trackrelative maximum optical intensity values rather than relative minimumoptical intensity values for the sake of performing a reflectivityanalysis. Thus, in some cases, a fringe line used for topographypurposes may be the same fringe line used for reflectivity analysis(e.g., both are relative minimum); while, in other cases a fringe lineused for topography purposes may be different from a fringe line usedfor reflectivity analysis (e.g., one is a relative minimum while anotheris a relative maximum).

[0143] Also, in further embodiments, interferometer characteristics thatare spatially and/or wavelength dependent may be characterizedbeforehand so that any resulting detrimental affect(s) upon areflectivity measurement can be successfully canceled out. For example,if a first pixel location is known to observe less light intensity thana second pixel location (e.g., on account of optical imperfectionsassociated with the interferometer), those of ordinary skill will beable separate optical intensity differences (as between the pair ofpixels) that are attributed to the interferometer's imperfections fromthose that are attributable to the sample's own characteristicreflectivity properties. The same may be said for an interferometer'swavelength related inconsistencies or imperfections (if any).

[0144] In a simplest case, the methodology of which is observed in FIG.18b, the sample is assumed to be uniformly comprised of a singlecomposition (e.g., the sample is uniformly comprised of Co; or,uniformly comprised of Si₃N₄, etc.). Because of the uniform compositionof the sample, the fringe lines are “free to move” over the surface ofthe detector without affecting the overall reflectivity experiment.Here, recalling from the Background that fringe lines are separated inaccordance with ˜λ/θ, the adjusting 1811 of the optical sourcewavelength (λ) between reflectivity calculations (or at least opticalintensity recordings) 1810 will cause the fringe lines to move upon thesurface of the detector. However, because spatial and wavelength relatedinconsistencies of the interferometer can be canceled out; and because,the sample has uniform reflectivity, the “reflectivity vs. wavelength”curve can be recorded irrespective of fringe line position.

[0145] In a more likely scenario, which is elaborated upon in FIG. 18c,it may be more desirable to realign the fringe lines with each change inwavelength. That is, after the wavelength is changed 1821, an attempt ismade to re-position 1822 the fringe lines so that appear in the sameposition that they did during exposure at the previous wavelength. Thisallows the measurement to determine reflectivity at specific regions ofthe sample because of the manner in which they map to the sample stage.As such, should the sample be comprised of different mixtures ofmaterials or substances (e.g., a first regions is Silicon (Si) and asecond region is Copper (Cu)), the interferometer is capable ofidentifying different mixtures on a pixel-by-pixel basis.

[0146] That is, a first “reflectivity vs. wavelength” curve can bemeasured for the portion of the sample that maps to a first pixellocation; and, a second “reflectivity vs. wavelength” curve can bemeasured for the portion of the sample that maps to a second pixellocation. By keeping track of separate curves for different pixels (orperhaps different groups of pixels), should the sample have differentmaterials/substances at the mapped to locations, different “reflectivityvs. wavelength” curves will reveal themselves as between the differentpixel locations. As such, different materials/substances can beidentified at precise sample locations.

[0147] Fringe lines may be re-positioned 1822, for example, by adjustingthe tilt angle of the reference mirror so as to compensate for themovement that was caused by the change in wavelength. As such, a “new”data point for a “reflectivity vs. wavelength” curve can be generatedby: 1) changing 1821 the wavelength of the lightsource; 2) adjusting1822 the fringe lines so as to overlap with their position(s) thatexisted prior to the wavelength change; and 3) calculating and storingreflectivity at the fringe lines (or at least storing the observedintensity so that intensity can be later calculated) 1820. Note thatreflectivity calculations can be readily made by those of ordinary skillbecause those of ordinary skill recognize that observed intensity isproportional to the reflectivity of the sample.

[0148] Note that, similar to the technique discussed previously withrespect to FIGS. 16a, 16 b and 17, once a first group of reflectivitycurves have been developed for a first set of fringe line positions(e.g., by looping through the methodology of FIG. 18c multiple times forthe first set of fringe line positions), a second group of reflectivitycurves may be developed for a second set of fringe line positions (e.g.,by looping through the methodology of FIG. 18c multiple times for thesecond set of fringe line positions).

[0149] The corresponding groups of reflectivity curves may then beinterleaved (e.g., akin to the concept discussed with respect to FIG.17) so that sample composition can be determined to a finer degree ofresolution. Note also that procedures for performing sample“reflectivity vs. wavelength” analysis (e.g., as described just above)may be combined with (e.g., by preceding or by following) procedures fordetermining sample topography (e.g., as discussed in preceding sections)so that a complete description of a sample that measures both itssurface topography and its material composition can be realized.

[0150] Also, referring briefly back to FIG. 10a, the data processingunit 1020 may be configured to keep track of the measured reflectivityvs. wavelength curves (e.g., via software or hardware). Furthermore, thedata processing unit 1020 may be configured to compare the measuredcurves against a data-base of such curves for known materials orsubstances (e.g., by correlating the measured curves against the curvesstored in the database) so as to determine that a particular curvematches the curve of a known material or substance. Since many of thesetechniques can be implemented in software, they may be embodied in amachine readable medium.

[0151] 7.0 Signal Processing Techniques For Measuring Fringe LineDisturbances That Extend Outside Their Associated Reference Fields

[0152] Referring back to FIG. 13, note that the fringe line disturbancesare “agreeable” in the sense that each fringe line disturbance remainswithin its corresponding reference field. A reference field correspondsto the field of optical image data that resides adjacent to a fringeline that the fringe line, when disturbed, will first project into inorder to demonstrate a change in sample height. For example, referringto FIG. 12a the field of image data between fringe lines 1204 and fringeline 1203 correspond to the reference field for fringe line 1204, thefield of image data between fringe lines 1203 and fringe line 1202correspond to the reference field for fringe line 1203, etc.

[0153] Comparing FIGS. 12a and 13 then, note that the combination ofmaximum sample height and fringe line spacing is such that each fringeline disturbance is kept within its own reference field. This makes forrelatively straightforward generation of the sample topography profilesobserved in FIG. 14. That is, the pixel locations of an entire fringeline and its associated disturbances can be readily stored, alone (i.e.,without being accompanied by the pixel locations of other fringe lines)to a particular memory location (e.g., that is partitioned for thefringe's lines reference field) and compared to is correspondingundisturbed fringe line position.

[0154] Thus, in general, according to various embodiments, a pre-definedmaximum, measurable/allowable sample height may be recognized such thatfringe line disturbances are designed to be kept within theircorresponding field of reference. This keeps the signal processingneeded for deriving topographical information nearer a minimum degree ofsophistication. Note that any such “maximum height” configuration can beeasily established through manipulation of fringe line spacing (e.g.,adjustment of tilt angle θ). Furthermore, measurement resolution is notlost because interleaving techniques (e.g., as discussed with respect toFIGS. 16a, 16 b and 17) can be used as appropriate to developtopographical descriptions having a desired resolution.

[0155] By contrast, however, should it be desirable to readily measurefringe line disturbances that breach their respective reference fields,more robust signal processing techniques may be used to accurately“track” a particular fringe line. That is, for example, if memoryresources are again partitioned so as to organize the storing of dataaccording to the image's reference fields, the pixel locations ofdifferent fringe lines may reside within a common reference field. FIG.19a shows an exemplary depiction of a fringe lines 1951 b, 1951 c, 1951d observed on a detector 1905 that breach their corresponding referencefields. Correspondingly, note that segments BC, EF of fringe line 1951 band segments HI, JK of fringe line 1951 c reside within the same fieldof reference field (that is located between undisturbed fringe linelocations 1913 and 1912).

[0156]FIG. 19b shows an exemplary depiction of a sample 1960 that couldcause the fringe line disturbances observed in FIG. 19a. Here, note thatfringe lines 1951 a, 1951 b, 1951 c, 1951 d, 1951 e of FIG. 19arespectively map to tracings 1952 a, 1952 b, 1952 c, 1952 d, 1951 e ofFIG. 19b. Comparing sample 1960 of FIG. 19b to sample 460 of FIG. 4b,note that the taller sample 1960 of FIG. 19b (as compared to the shortersample 460 of FIG. 4b) may have caused fringe lines 1951 b, 1951 c, 1951d to breach their respective reference fields.

[0157]7.1 Memory Partitioning on a Reference Field-by-Reference FieldBasis

[0158] Before commencing a discussion of more sophisticated signalprocessing techniques suitable for tracking multiple fringe lines withinthe same reference field, a brief discussion as to how memory resourcesused to store the pixel data of detected fringe line disturbances (e.g.,such as memory 1023, 1523 of FIGS. 10 and 15, respectively) can bepartitioned so as to store pixel data on a reference field by referencefield basis. It is important to emphasize at the onset of thisdiscussion that memory partitioning on a reference field by referencebasis can be undertaken regardless if fringe lines “are” or “are not”expected to breach their respective reference fields. As such, memorypartitioning can be applied to the signal processing techniquespreviously discussed with respect to FIGS. 13 through 15 as well asthose environments where the fringe lines breach their respectivereference fields as observed in FIG. 19a.

[0159] Analyzing stored image data on a reference field by referencefield basis allows for easy/efficient memory management. That is, thememory resources used to store the disturbed image data (e.g., memoryresource 1023 of FIG. 10a) can be viewed as being partitioned into thereference field sections themselves. This, in turn, allows for easymemory organization/usage regardless of where fringe lines are detectedon the detector from measurement to measurement and sample to sample.

[0160] For example, according to one embodiment, the storage of thereference scale information includes the storage (e.g., into memoryresource 1024 of FIG. 10a) of each z axis location on the detector wherean undisturbed fringe line resides. As such, a first pre-establishedmemory location can be reserved for the storage of the z axis location(e.g., “z₁”) for a first undisturbed fringe line (e.g., fringe line 1205of FIG. 12a), a second pre-established memory or register region can bereserved for the storage of the z axis location (e.g., “z₂”) for asecond undisturbed fringe line (e.g., fringe line 1204 of FIG. 12a),etc.

[0161] As such, the borders of the reference fields (i.e., the locationsof neighboring, undisturbed fringe lines) are always stored inpreviously defined memory/register locations—regardless if the bordersthemselves change from reference scale to reference scale. That is, forexample, the first reference field can always be recognized as beingbounded by the z axis values z₁ and z₂ that have been stored between thefirst and second pre-established memory locations of memory 1024—even ifthe test equipment stores different measurement scale embodiments (e.g.,different fringe line spacings) over the course of its useful life.

[0162] As a consequence, the pixel locations of the detected fringe linedisturbances can be easily “binned” according to their particularreference field. Better said, with knowledge of the reference fieldborders, the fringe detection unit 1006 can store fringe line sectionswithin the same reference field region into a common region of memory1023 (e.g., referring to FIG. 19a, the pixel coordinates of fringe linesections HI, BC, EF and JK can be stored into a common memory locationof memory 1023). Furthermore, these regions of memory 1023 can bepre-established as well (e.g., a first pre-established region of memory1023 is reserved for pixel values detected within a first referencefield—regardless of the z axis borders for the first reference field; asecond pre-established region of memory 1023 is reserved for pixelvalues detected within a second reference field—regardless of the z axisborders for the first reference field;, etc.).

[0163] Furthermore, the topography measurement unit 1007 can beconfigured to automatically read from these pre-established regions ofmemory 1023 in order to purposely extract data within a certainreference field and without knowledge of the specific z axis bordersthemselves. For example, the topography measurement unit 1007 may bepre-configured to: 1) read from a first address (or group of addresses)to obtain the pixel locations of detected fringe lines within a “first”reference field; 2) read from a second address (or group of addresses)to obtain the pixel locations of detected fringe lines within a “second”reference field;, etc, As such, access to the specific z axis bordervalues are not needed by the topography measurement unit according tothis perspective.

[0164] 7.2 Tracking Multiple Fringe Lines within the Same ReferenceField

[0165] As mentioned previously, memory resources may be partitioned on areference field by reference basis regardless as to whether or notfringe lines are expected to breach their corresponding referencefields. For example, referring to FIGS. 13 and 12a: 1) the pixellocations of fringe lines 1205 and 1305 may be read from memories 1024,1023 as a consequence of reading the undisturbed and disturbed data fora first reference field (these may then be subtracted from one anotherto form topography profile 1405); 2) the pixel locations of fringe lines1204 and 1304 may be read from memories 1024, 1023 as a consequence ofreading the undisturbed and disturbed data for a second reference field(these may then be subtracted from one another to form topographyprofile 1404);, etc.

[0166] However, if fringe line disturbances are expected to breach theircorresponding reference fields, more sophisticated signal processingtechniques may be necessary. Better said, once fringe line disturbancesare allowed to breach their reference fields, different fringe lines mayoccupy the same reference space. As such, a technique should be usedwhere different fringe lines can be recognized within the same referencefield space so that their respective disturbance(s) can be correctlymeasured. For example, fringe line segment BC of FIG. 19a represents agreater height above the sample stage that does fringe line segment HI.As such, the different fringe lines should be recognized so that theircorresponding, undisturbed positions can be used a reference formeasuring topography.

[0167]FIG. 20 shows a signal processing technique that emphasizes thetracking of the individual slopes (i.e., “edges”) of a fringe linedisturbances in order to deal with the presence of different fringelines within a common reference field. Furthermore, while a particularfringe line disturbance edge is being tracked, calculations are made totranslate each fringe line disturbance position into its correspondingsample height (z_(s)). With knowledge of the specific locations in xysample stage space, the signal processing technique is able to producean “output” that corresponds to specific x, y, z_(s) data positions.These x,y z_(s) data positions can then be stored or plotted to displaythe overall topography of the sample. Furthermore, as described in moredetail below, the technique allows for further compression of the pixeldata points to further reduce processing overhead.

[0168] According to the signal processing technique of FIG. 20, trackedges from different fringe lines are tracked 2001 across each referencefield in a first direction (e.g., in a “downward” sloped direction asobserved in FIG. 19a). For example, in order to execute the firsttracking sequence 2001, the technique may: 1) read from a memory theimage data corresponding to the reference field between undisturbedfringe line locations 1914 and 1913; and, track the downward edgesegment “AB” of fringe line 1951 b; then, 2) read from a memory theimage data corresponding to the reference field between undisturbedfringe line locations 1913 and 1912 and track the downward edge segments“BC” of fringe line 1951 b and “Hi” of fringe line 1951 c;, etc.Eventually the reference field beneath undisturbed fringe line location1911 will be processed signifying the end of sequence 2001.

[0169] Then, in over the course of executing the second trackingsequence 2001 in an “upward” direction, the technique may (after thereference fields beneath location 1911 and between locations 1911 and1912 have already been processed): 1) read from a memory the image datacorresponding to the reference field between undisturbed fringe linelocations 1913 and 1912 and track the upward edge segments “EF” offringe line 1951 b and “JK” of fringe line 1951 c; then, 2) read from amemory the image data corresponding to the reference field betweenundisturbed fringe line locations 1914 and 1913; and, track the upwardedge segment “FG” of fringe line 1951 b;, etc,. Eventually the referencefield between fringe line locations 1915 and 1914 will be processedsignifying the end of sequence 2002.

[0170]FIGS. 21a through 21 c are directed to an embodiment of amethodology that may be used to process data in either the upward ordownward direction. FIG. 21a shows the methodology, FIG. 21b relates toits application in the “downward” direction, and, FIG. 21c relates toits application in the “upward” direction. An example of operation ineach direction will be subsequently discussed. Referring to FIGS. 21aand 21 b, a reference field worth of data is read 2101 from itscorresponding memory location. Here, the reference field worth of datamay be retrieved 2101 with an address location (or group of addresslocations) where the pixel locations for detected fringe lines thatreside within the reference field in question are found within thememory.

[0171] Then, starting at its intercept with the upper border of thereference field, each fringe line segment is “tracked” (e.g., byrecognizing the existence of proximate pixel locations) whiletranslating it into sample height z_(s) at the proper xy sample stagepositions 2102. The tracking and translating 2102 can be viewed asmultidimensional 2102 ₁ through 2012 _(n) where the dimension sizedepends on the number of different fringe line segments that are to beprocessed. That is, if one segment requires processing in the downwarddirection (e.g., as is the case with respect to the reference fieldbetween positions 1914 and 1913) n=1; if two segments require processingin the downward direction (e.g., as is the case with respect to thereference field between positions 1913 and 1912) n=2;, etc.

[0172] A fringe line segment may be tracked in the downward direction bystarting at its intercept with its “upper” border and searching for orotherwise recognizing the existence of (within the reference field data)a proximately located pixel coordinate (e.g., by scanning the data andseizing the closest pixel location that is “down and/or to the right” ofthe intercept—in simple cases this should correspond to just selectingthe pixel location having the next highest x value). The process is thencontinually repeated until the intercept point with the next lowerreference field is reached; or, the fringe line doubles back andrecrosses the upper border.

[0173] Each pixel location of a fringe line segment may be translatedinto its appropriate x, y, z_(s) sample topography information throughthe use of the stored measurement scale information and an understandingof the overall geometry and optics. In an embodiment, consistent withthe illustrations provided herein, for any fringe line pixel location(x,z): 1) the appropriate sample stage x coordinate value is determinedby factoring the x coordinate of the pixel by a “per pixel resolution inthe x and y direction” parameter (e.g., such as that discussed towardthe end of section 3.1); 2) the appropriate sample stage y coordinatevalue is determined by reference to the particular fringe line beingtracked (e.g., fringe line 1951 b is understood to be y axis location −Yon the sample stage) and, 3) the appropriate sample height z_(s) isdetermined according to the relationship

z _(s) =REF2+(R−dz)

[0174] where: a) REF2 is a “baseline reference” that takes into accounthow many reference fields the fringe line has already breached; b) R isthe “sample height per reference field breach”; and c) dz is thedifference between the pixel's z axis detector location and the locationof the lower reference field border REF1 (i.e., z-REF1) factored by aper pixel unit of sample height parameter. A more thorough discussion ofeach of these follows below.

[0175] REF2 can be viewed as a variable that is kept track of for eachfringe line. That is, in various embodiments, a separate REF2 variableis maintained for each fringe line being tracked. Each time a fringeline breaches another reference field, its corresponding REF2 variableis incremented by N(Δz) where N is the number of pixels (along the zaxis of the detector) between neighboring fringe lines and Δz is the perpixel unit of sample height (e.g., as discussed in section 3.2). Assuch, when a fringe line is within its field of reference (such asfringe line 1951 b segment AB) the REF2 variable is 0 has not yetbreached its field of reference.

[0176] When a fringe line breaches its first field of reference andneeds to be tracked across a second field of reference (such as fringeline 1951 b segment BC), the fringe line's REF2 variable will beincremented to a value of N(Δz) for the translation process that occursin the fringe line's second field of reference. Similarly, should thefringe line breach into a third field of reference, the fringe line'sREF2 variable will be incremented to a value of 2N(Δz) for thetranslation process that occurs in the third field of reference, etc. Assuch, the REF2 variable for a fringe line converts each field ofreference breach into a corresponding sample height distance.

[0177] Whereas the REF2 variable represents the amount of sample heightthat has been measured “so far” for a particular fringe line, R (the“sample height per reference field breach”) represents the field ofsample height locations that are implicated by the tracking of thefringe line within the field of reference that is currently beingprocessed. As such, R is a fixed value of N(Δz). Here, for any detectorz axis location, the term R-dz effectively represents, how far into thecurrent reference field the fringe line has extended. That is, as dzrepresents the per pixel unit of sample height Az factored by thedistance above REF1 (referring to FIG. 21b) that a particular pixellocation corresponds to, when dz is 0, the fringe line has completedexpanded the reference field so as to intercept the next lower field ofreference (e.g., point B in FIGS. 21b and 19 a); and, when dz is R/2 thefringe line has breached halfway into the current reference field, etc.

[0178] When the “downward” sloped fringe lines have been tracked in areference field, the looping nature of the methodology of FIG. 21aindicates that the data for a next lower reference field will beextracted and analyzed. For example, after the reference field betweenlocations 1914 and 1913 is analyzed (so as to track segment AB of fringeline 1951 b), the reference field between locations 1913 and 1912 willbe analyzed next (so as to track segments BC of fringe line 1951 b andHI of fringe line 1951 c), etc. Here, in between a pair of referencefield analysis', the intercept point of each fringe line isidentified/recorded 2103 for each fringe line that has breached into anext lower reference field (e.g., points C and I after the referencefield between locations 1913 and 1912 is analyzed).

[0179] For those fringe lines that do not breach into the next field ofreference some form of data compression may be undertaken. For example,in the case of fringe line 1951 b when the reference field betweenlocations 1912 and 1911 is being analyzed, the data tracking process maybe terminated at point D1 such that only the edges of the sample areactually measured. Alternatively, the tracking process may be sloweddown from point D1 to point D2 so that the density of translated samplepoints is reduced when running across a flat plane of the sample. Eitherof these techniques reduces the number of pixel locations used fortopography information; which, in turn, corresponds to a form of datacompression.

[0180] After the downward sloped fringe line edges are tracked, asimilar process is repeated but in the opposite, upward direction. Here,the methodology of FIG. 21a may again be referred to. FIG. 21c relatesto the processing of the fringe line segment EF of fringe line 1951 b(when the reference field between locations 1913 and 1912 is analyzed).Here, the processing in the upward direction is similar to that of thedownward direction.

[0181] The most significant difference is that, in one embodiment, theappropriate sample height z_(s) is determined according to therelationship

z _(s) =REF2−dz

[0182] where REF2 is the same “baseline reference” that takes intoaccount how many reference fields the fringe line has alreadybreached—but, in the upward direction it is decremented (rather thanincremented) by N(Δz) each time a higher reference field is analyzed.Note that the lower border for purposes of determining dz in this caseis REF2. Once all the fringe lines have been tracked and the trackingprocess reaches the highest field of reference, a collection of(x,y,z_(s)) data points are left remaining that describe the topographyof the sample in three dimensions. Those of ordinary skill will be ableto develop topography measurement unit 1007 software and/or hardwarethat can perform the techniques described just above.

[0183] 8.0 Closing Statement

[0184] In the foregoing specification, the inventions have beendescribed with reference to specific exemplary embodiments thereof. Itwill, however, be evident that various modifications and changes may bemade thereto without departing from the broader spirit and scope of theinvention as set forth in the appended claims. The specification anddrawings are, accordingly, to be regarded in an illustrative rather thana restrictive sense.

What is claimed is:
 1. A method, comprising: a) measuring a first set ofinterferometer fringe line disturbances against a pre-determinedmeasurement scale information in order to generate a first set ofprofiles that describe the topography of a sample that is placed upon asample stage associated with said interferometer, said first set ofprofiles mapping to traces that run over a first axis of said sample andsaid sample stage, said traces having a recognized spacing between oneanother along a second axis of said sample and said sample stage; b)adjusting the relative position of said traces to said sample so as tocreate a second set of fringe line disturbances; c) measuring saidsecond set of interferometer fringe line disturbances against saidpre-determined measurement scale information in order to generate asecond set of profiles that describe the topography of said sample; andd) interleaving said first set of profiles and said second set ofprofiles to create a topography description of said sample having aresolution along said second axis that is smaller than said spacing. 2.The method of claim 1 wherein said adjusting further comprises movingsaid sample stage.
 3. The method of claim 1 wherein said adjustingfurther comprises altering the phase of light produced by a light sourcethat is a part of said interferometer.
 4. The method of claim 1 whereinsaid adjusting further comprises altering the position of a tiltedreference mirror that is part of said interferometer.
 5. The method ofclaim 1 wherein said adjusting is accomplished by using a differentwavelength.
 6. The method of claim 1 further comprising storing saidtopography description.
 7. The method of claim 6 wherein said storingfurther comprises storing into a volatile memory.
 8. The method of claim6 wherein said storing further comprises storing into a non-volatilememory.
 9. The method of claim 1 further comprising displaying saidtopography description on a screen so that said topography descriptioncan be viewed.
 10. The method of claim 1 wherein said measuring a firstset of interferometer fringe line disturbances further comprises: a)detecting said fringe lines from an optical intensity pattern providedfrom a detector associated with said interferometer; and b) comparingthe shapes of said detected fringe lines at their respective locationsagainst said pre-determined measurement scale information to form saidfirst set of profiles, said pre-determined measurement scale informationfurther comprising the shapes of said detected fringe lines at theirrespective positions when said fringe lines were undisturbed.
 11. Themethod of claim 10 wherein said pre-determined measurement scaleinformation further comprises a parameter that translates the extent ofeach of said disturbances into a measurement of the height of saidsample.
 12. The method of claim 10 wherein said detecting said fringelines further comprises detecting the relative minima within saidoptical intensity pattern.
 13. The apparatus of claim 10 furthercomprising compressing the data from which said first set of profilesare comprised.
 14. An apparatus, comprising: a) an interferometer, saidinterferometer further comprising: 1) a sample stage upon which a sampleis placed and 2) a detector that observes a plurality of fringe lines;and b) a data processing unit that 1) measures a first set of fringeline disturbances against a pre-determined measurement scale informationin order to generate a first set of profiles that describe thetopography of said sample, said first set of profiles mapping to tracesthat run over a first axis of said sample and said sample stage, saidtraces having a recognized spacing between one another along a secondaxis of said sample and said sample stage; 2) adjusts the relativeposition of said traces to said sample so as to create a second set offringe line disturbances; 3) measures said second set of interferometerfringe line disturbances against said pre-determined measurement scaleinformation in order to generate a second set of profiles that describethe topography of said sample; d) interleaves said first set of profilesand said second set of profiles to create a topography description ofsaid sample having a resolution along said second axis that is smallerthan said spacing.
 15. The apparatus of claim 14 wherein said apparatussaid adjusts the relative position of said traces by moving said samplestage.
 16. The apparatus of claim 14 wherein said apparatus said adjuststhe relative position of said traces by altering the phase of lightproduced by a light source that is a part of said interferometer. 17.The apparatus of claim 14 wherein said apparatus said adjusts therelative position of said traces by altering the position of a tiltedreference mirror that is part of said interferometer.
 18. The apparatusof claim 14 wherein said apparatus said adjusts the relative position ofsaid traces by using a different wavelength.
 19. The apparatus of claim14 wherein said data processing unit is designed to store saidtopography description.
 20. The apparatus of claim 19 wherein said dataprocessing unit is designed to store said topography description into avolatile memory.
 21. The apparatus of claim 19 wherein said dataprocessing unit is designed to store said topography description into anon-volatile memory.
 22. The method of claim 14 wherein said dataprocessing unit is designed to display said topography description on ascreen so that said topography description can be viewed.
 23. Theapparatus of claim 14 wherein said data processing unit said measures afirst set of interferometer fringe line disturbances by: a) detectingsaid fringe lines from an optical intensity pattern provided from adetector associated with said interferometer; and b) comparing theshapes of said detected fringe lines at their respective locationsagainst said pre-determined measurement scale information to form saidfirst set of profiles, said pre-determined measurement scale informationfurther comprising the shapes of said detected fringe lines at theirrespective positions when said fringe lines were undisturbed.
 24. Theapparatus of claim 23 wherein said pre-determined measurement scaleinformation further comprises a parameter that translates the extent ofeach of said disturbances into a measurement of the height of saidsample.
 25. The apparatus of claim 23 wherein said data processing unitsaid detects said fringe lines by detecting the relative minima withinsaid optical intensity pattern.
 26. The apparatus of claim 23 whereinsaid data processing unit compresses the data from which said first setof profiles are comprised.
 27. An apparatus, comprising: a) means formeasuring a first set of interferometer fringe line disturbances againsta pre-determined measurement scale information in order to generate afirst set of profiles that describe the topography of a sample that isplaced upon a sample stage associated with said interferometer, saidfirst set of profiles mapping to traces that run over a first axis ofsaid sample and said sample stage, said traces having a recognizedspacing between one another along a second axis of said sample and saidsample stage; b) means for adjusting the relative position of saidtraces to said sample so as to create a second set of fringe linedisturbances; c) means for measuring said second set of interferometerfringe line disturbances against said pre-determined measurement scaleinformation in order to generate a second set of profiles that describethe topography of said sample; and d) means for interleaving said firstset of profiles and said second set of profiles to create a topographydescription of said sample having a resolution along said second axisthat is smaller than said spacing.
 28. The apparatus of claim 27 whereinsaid adjusting further comprises moving said sample stage.
 29. Theapparatus of claim 27 wherein said adjusting further comprises alteringthe phase of light produced by a light source that is a part of saidinterferometer.
 30. The apparatus of claim 27 wherein said adjustingfurther comprises altering the position of a tilted reference mirrorthat is part of said interferometer.
 31. The apparatus of claim 27wherein said adjusting is accomplished by using a different wavelength.32. The apparatus of claim 27 further comprising means for storing saidtopography description.
 33. The apparatus of claim 32 wherein said meansfor storing further comprises means for storing into a volatile memory.34. The apparatus of claim 33 wherein said means for storing furthercomprises means for storing into a non-volatile memory.
 35. Theapparatus of claim 27 further comprising means for displaying saidtopography description on a screen so that said topography descriptioncan be viewed.
 36. The apparatus of claim 27 wherein said means formeasuring a first set of interferometer fringe line disturbances furthercomprises: a) means for detecting said fringe lines from an opticalintensity pattern provided from a detector associated with saidinterferometer; and b) means for comparing the shapes of said detectedfringe lines at their respective locations against said pre-determinedmeasurement scale information to form said first set of profiles, saidpre-determined measurement scale information further comprising theshapes of said detected fringe lines at their respective positions whensaid fringe lines were undisturbed.
 37. The apparatus of claim 36wherein said pre-determined measurement scale information furthercomprises a parameter that translates the extent of each of saiddisturbances into a measurement of the height of said sample.
 38. Theapparatus of claim 36 wherein said means for detecting said fringe linesfurther comprises means for detecting the relative minima within saidoptical intensity pattern.
 39. The apparatus of claim 36 furthercomprising means for compressing the data from which said first set ofprofiles are comprised.
 40. The apparatus of claim 27 wherein means formeasuring a first set of interferometer fringe line disturbances andsaid means for measuring said second set of interferometer fringe linedisturbances are the same means.